Noburu Fukushima Chief Fellow, Toshiba R&D Center Corporate Vice President Status Address: 1, Komukaitoshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan E-mail: noburu.fukushima@toshiba.co.jp URL: http://www.toshiba.co.jp/rdc/index.htm

Expertise : Noburu Fukushima received his bachelor’s degree, master’s degree and PhD from Waseda University. He joined Toshiba in 1982, working in the materials science and device physics fields at the Toshiba Corporate R&D Center, focusing on areas such as oxide conductors, high-Tc superconductors and high-k gate insulators. From 2002, he presided over the research laboratory for advanced research in LSI devices and materials. From 2006 to 2011, he presided over the laboratories for nano-materials and devices as an Assistant Director of the R&D Center. Currently, he is a chief fellow at the Toshiba R&D Center and his research interests have been in new devices that will utilize surface/interfacial properties, phase transitions and electro-magnetic effects in condensed matter.